Perovs Sets 20.87% Record for Large Perovskites

Jan 14, 2026 10:36 AM ET
  • Perovs hits TÜV-certified 20.87% efficiency on mass-produced large-area perovskite modules, 150.26 W, as it scales from a 100 MW pilot to a 1 GW plant and GW-level base.
Perovs Sets 20.87% Record for Large Perovskites

Perovs said its mass-produced large-area perovskite modules hit a certified 20.87% conversion efficiency on a 1.2×0.6 m² format, delivering 150.26 W, according to TÜV NORD. The company emphasized the result was achieved with standard mass-production processes on a relevant module size.

Perovs runs a 100 MW pilot line in Wuxi, Jiangsu, and is building a 1 GW manufacturing plant in Chongqing, slated to be structurally topped out in February. Last month it signed a pact with Wenling City, Zhejiang, to develop a GW-level base for new energy equipment, including automated production lines for high-efficiency crystalline silicon PV, perovskites and OPV.

What enabled Perovs’ 20.87% efficiency on 1.2×0.6 m² mass-made modules?

  • Scalable, uniform large-area coating (slot-die/blade) with in-line drying/annealing to grow dense, low-defect perovskite films across 1.2×0.6 m substrates
  • Triple-cation, mixed-halide perovskite composition (e.g., FA/MA/Cs with optimized Br/Cl) plus trace additives to boost phase stability and Voc
  • Interface engineering: low-defect SnO2 electron transport layer and high-work-function HTL (e.g., NiOx or MeO-2PACz SAM) to cut interfacial recombination
  • Surface/defect passivation using alkali halides, fullerene derivatives, and ultrathin 2D capping layers (PEA/BA) to suppress non-radiative losses
  • High-precision laser scribing with narrow P1/P2/P3 lines to minimize dead area and series resistance in monolithic interconnects
  • Low-resistance TCO (ITO/IZO) with damage-mitigated sputtering, plus fine metal grid or Cu plating to reduce sheet resistance without shading penalties
  • Light-management stack: textured low-iron glass, dual AR coatings, high-transmittance POE, and reflective backsheet to raise Jsc
  • Robust encapsulation and edge seals with moisture/oxygen barriers and UV/thermal stabilizers to maintain performance through certification tests
  • Tight process control and in-line metrology (PL/EL mapping, sheet-resistance and thickness monitoring) to ensure film uniformity and yield
  • Lamination and thermal budgets tuned to protect perovskite/HTL layers and preserve contact conductivity
  • Ion-migration and hysteresis mitigation via crosslinkable HTLs and mobile-ion suppressors for stable MPP and FF at scale
  • Seamless scale-up from pilot recipes to automated mass-production tools, holding narrow tolerances on coating, scribing, and alignment